![Copper Sputter Target [Cu] CF Tee These ball valves have an](https://cdn.shopify.com/s/files/1/0117/2714/2969/products/CuTarget.jpg?v=1539227820)
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These ball valves have an NW-KF vacuum flange for connection to the vacuum system
5L/min @1 bar
SA00010 In development Onboard RS485 data protocol
silicones or halogenated paraffins decompose at radiation levels of 0
Copper Sputter Target [Cu] CF Tee These ball valves have anCopper Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Various diameters, thicknesses and purities available to suit all major sputter source manufacturers. If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation. All our materials are tested using ICP OES chemical analysis and manufactured under ISO9001: 2008 certification. Materials are vacuum packed under cleanroom
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